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TCO layer in Display E-Beam & Ion plating High-Refractive Index LED chip

Material for TCO layer in Display

Product Introduction

  • It can produce the transparent conductive oxide layer by the sputtering system and applied for the major materials in the area of Display

Product Specification

ITO(Indium Tin Oxide) Target
  • TCO material composed of In2O3/SnO2
    • Composition: 90wt% In2O3 + 10wt% SnO2
    • Actual Density: >7.1g/㎤
      (Above 99% of the theoretical material density )
    • Purity: Above 99.99%
  • Available in the form of planar or rotary
    • Planar type 1250mm X 300mm X 6~14mmT
    • Rotary type ID135mm X OD155 X L400mm

OXIDE TFT Material

Product Specification

IGZO(Indium Gallium Zinc Oxide) Target
  • TCO material composed of In2O3/SnO2
    • Composition : In:Ga:Zn=1:1:1, 2:2:1, 2:1:2, 4:2:1
    • Actual Density : >6.27g/㎤ (Above 99% of the theoretical material density)
    • Purity: Above 99.99%
  • Available in the form of planar or rotary
    • Planar type 1250mm X 300mm X 6~14mmT
    • Rotary type ID135mm X OD155 X L400mm


Product Application

  • Transparent Conductive Electrode (LCD, Touch Panel Screen, PDP, Organic EL, Smart Windows, Solar Cell)
  • EMI Shield Coating